Events

Abstract: Spin qubits systems are highly sensitive to defects. While dynamic ones, also know as Two-level fluctuators, impact the fidelity of quantum gates, static defects primarily limit the scalability of the system by creating non-tuneable quantum dots at undesired locations. IMEC 300mm process line leverages state-of-the-art industrial tools while maintaining high processes flexibility, making it a unique platform to address this defectivity challenge.  Consequently, our efforts have focused on optimizing processes and designs to achieve very low noise and low disorder quantum dots in both MOS and Si/SiGe devices.

In this presentation, I will first outline IMEC’s strategy and process flows for device optimization. I will give an overview of the results obtained on our devices across various institutions. Finally, recognizing that having some good qubit is not sufficient, I will show as an outlook an architecture relying on full back end of line processes. With this architecture, enabled by advanced optical EUV lithography, IMEC will now tackle scaling challenges.