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   Surface Engineering for Electron-on-Neon Quantum Computing Platforms

 

Kater Murch (Washington University, St. Louis, Missouri)

 

Date/Time: Tuesday, 24th June 2025 at 2:00 pm

 

Place: Room Rémy Lemaire K223, Institut Néel

 

Abstract: Electrons confined to solid neon surfaces manipulated through circuit quantum electrodynamics (circuit QED) architecture represent a promising quantum computing platform with demonstrated impressive coherence times. I will present two interconnected investigations critical to advancing this technology. First, we examine how resonator and substrate surface properties influence the formation of electron-on-neon (eNe) charge states and their coupling to microwave resonators. Our experimental observations reveal that shallow-depth etching maximizes coupling strength, while comparisons of trapping statistics across devices with varied surface roughness elucidate the crucial role of fabrication-induced surface features in forming strongly coupled eNe states. These findings motivate our second investigation: characterizing the growth kinetics and film properties of neon on microchips. Using high-Tc YBCO microwave resonators, we analyze the uniformity, conformality, and solidification dynamics of both quench-condensed and liquid-grown neon thin films. Our microwave measurements between 4-30K reveal novel film thickness dynamics near neon’s triple point, providing a comprehensive picture of neon deposition behavior on microwave resonators. Together, these studies address fundamental challenges in surface engineering and material growth essential for developing scalable electron-on-neon quantum computing systems.