The EpiCM technological group develops and optimizes original experimental set-ups operating mainly under vacuum and ultra-high vacuum as well as processes for growing innovative nano-materials. The diversity of produced materials is wide by their types and properties (semiconductors, metals, magnetic materials, superconductors, oxides and functionalized materials) as well as by their forms (thin layers, nano-objects and two-dimensional). EpiCM member’s skills in instrumental development, materials synthesis and related characterizations are provided to researchers with high quality interaction. Furthermore, the EpiCM group is also involved in some collaborative research projects with other public or private research laboratories and institutes.
Carbon nanotubes deposition by CVD STM image of graphene grown under UHV
The Epitaxy and thin layer (EpiCM) technological group operates and develops several growth set-ups: Molecular beam epitaxy (MBE), magnetron sputtering (PVD), pulsed laser deposition (PLD) and chemical vapor deposition (CVD) that are dedicated to the growth of epitaxial thin films of semiconductors, oxides and metals. The group collaborates with several research teams from Institut Néel and provides technical support to any user from the laboratory with a specific need in material development. The group is also largely involved in the design and supervision of new experimental environments (sputtering deposition reactor for metals and oxides multilayers, new multi technique chambers for epitaxy, clean rooms) as well as in the upgrade of existing reaction chambers. It contributes to the emergence of new research fields such as low dimensional object synthesis (quantum dots, semiconducting or magnetic nanowires, epitaxial graphene or transition metal dichalcogenide monolayers on metal, carbon nanotubes and diamond thin films). Furthermore, the EpiCM group is involved in high quality epitaxial thin film growth and characterization measurements in collaboration with research teams and other technological groups of Institut Néel. Thanks to its expertise in growth and instrumental development, the group manages material growth workpackages for several projects with researchers from other laboratories and institutes. Members of the EpiCM group are also strongly involved in the laboratory collective tasks such as trainings and safety and prevention.
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Person in charge: Arnaud CLAUDEL
Permanents
David BARRAL
Personnel Technique - CNRS
David.Barral [at] neel.cnrs.fr
Phone: 04 76 88 79 30
Office: D-107
Arnaud CLAUDEL
Personnel Technique - CNRS
arnaud.claudel [at] neel.cnrs.fr
Phone: 04 76 88 78 83
Office: D-411
Philippe DAVID
Personnel Technique - CNRS
Philippe.David [at] neel.cnrs.fr
Phone: 04 76 88 74 39
Office: D-210
Jean DUSSAUD
Personnel Technique - CNRS
jean.dussaud [at] neel.cnrs.fr
Office: CEA-X
Stéphanie GARAUDEE
Personnel Technique - CNRS
Stephanie.Garaudee [at] neel.cnrs.fr
Phone: 04 76 88 74 19
Office: F-213
Pierre GASNER
Personnel Technique - CNRS
pierre.gasner [at] neel.cnrs.fr
Phone: 04 76 88 79 67
Office: E-217b
Yann GENUIST
Personnel Technique - CNRS
yann.genuist [at] neel.cnrs.fr
Office: CEA-X
Pierre GIROUX
Personnel Technique - CNRS
Pierre.Giroux [at] neel.cnrs.fr
Phone: 04 76 88 79 23
Office: D-415
Valérie GUISSET
Personnel Technique - CNRS
valerie.guisset [at] neel.cnrs.fr
Phone: 04 76 88 10 50
Office: D-210
Gaël MOIROUX
Personnel Technique - CNRS
gael.moiroux [at] neel.cnrs.fr
Phone: 04 76 88 79 73
Office: E-217b
Sherine CHERAIFIA
Personnel Chercheur - CNRS
sherine.cheraifia [at] neel.cnrs.fr
Referent: Arnaud CLAUDEL
Islem GHRIBI
Personnel Chercheur - CNRS
islem.ghribi [at] neel.cnrs.fr
Phone: 04 76 88 70 61
Office: D-318
Referent: Arnaud CLAUDEL