Over the years, a ultra-high vacuum system (UHV, pressure in the 10-10 mbar range and below) has been progressively assembled. The last developments, achieved at the end of 2013 in close interaction with the Epitaxy and Layer Deposition technical group, yielded a set-up consisting of four UHV chambers interconnected via a UHV transfer tunnel (see photograph below).
The UHV chambers are equipped with :
variable temperature sample holders (50-1500 K in one chamber, 300-1100 K in the other),
growth facilities for pulsed laser deposition, molecular beam epitaxy, low-pressure chemical vapor deposition,
reflection high-energy electron diffraction capabilities,
residual gas analysis tools in one of the chambers,
a microwave-assisted ion gun in one of the chambers.
A third UHV chamber is focused on sample surface preparation, and includes for this purpose a heating stage, an Auger electron spectroscope, and an ion gun. It is also suited for chemical vapor deposition.
The fourth UHV chambers hosts a room-temperature Omicron scanning tunneling microscope.