The team has access to two state-of-the-art nanofabrication platforms : Nanofab and the PTA.
In these cleanrooms the following techniques are used :
- E-beam lithography up to 100keV
- Laser lithography
- UV and DUV lithography
- Etching (ICP, RIE, IBE...)
- Thermal and e-beam metal deposition (including a UHV system)
- Sputtering
- 30 keV SEM for observation


Nanofab ©CNRS Phototheque - Cyril FRESILLON
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